CVE-2026-33551

Published: Apr 10, 2026 Last Modified: Apr 13, 2026
ExploitDB:
Other exploit source:
Google Dorks:
LOW 3,5
Attack Vector: network
Attack Complexity: high
Privileges Required: low
User Interaction: none
Scope: changed
Confidentiality: none
Integrity: low
Availability: none

Description

AI Translation Available

An issue was discovered in OpenStack Keystone 14 through 26 before 26.1.1, 27.0.0, 28.0.0, and 29.0.0. Restricted application credentials can create EC2 credentials. By using a restricted application credential to call the EC2 credential creation API, an authenticated user with only a reader role may obtain an EC2/S3 credential that carries the full set of the parent user's S3 permissions, effectively bypassing the role restrictions imposed on the application credential. Only deployments that use restricted application credentials in combination with the EC2/S3 compatibility API (swift3 / s3api) are affected.

EPSS (Exploit Prediction Scoring System)

Trend Analysis

EPSS (Exploit Prediction Scoring System)

Prevede la probabilità di sfruttamento basata su intelligence sulle minacce e sulle caratteristiche della vulnerabilità.

EPSS Score
0,0002
Percentile
0,1th
Updated

EPSS Score Trend (Last 7 Days)

863

Incorrect Authorization

Incomplete
Common Consequences
Security Scopes Affected:
Confidentiality Integrity Access Control Availability
Potential Impacts:
Read Application Data Read Files Or Directories Modify Application Data Modify Files Or Directories Gain Privileges Or Assume Identity Bypass Protection Mechanism Execute Unauthorized Code Or Commands Dos: Crash, Exit, Or Restart Dos: Resource Consumption (Cpu) Dos: Resource Consumption (Memory) Dos: Resource Consumption (Other)
Applicable Platforms
Technologies: Database Server, Not Technology-Specific, Web Server
View CWE Details
https://bugs.launchpad.net/keystone/+bug/2142138
http://www.openwall.com/lists/oss-security/2026/04/07/12
https://bugs.launchpad.net/keystone/+bug/2142138
https://security.openstack.org/ossa/OSSA-2026-005.html